This is the patterning of interference layers of inorganic multi-layers by a lift-off process (reverse etching).
In order to pattern inorganic multi-layers without influencing a substrate, a lift-off method is used. The following diagram explains the patterning of inorganic multi-layered interference film filters.
* Align the pattern and repeat the same process for each color: R, G, B. one after another
* Excellent in weather resistance and heat resistance
* Higher transmittance than that of organic color filters
* More expensive than organic color filters because of the complexity of its process
|Coating^Etching^Bumps Making^Color Filter (Inorganic)
Micro Flexible Circuit Substrate^Mask/Mirror for lasers
|HOWA SANGYO CO.,LTD@|