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* Outline
This is the patterning of interference layers of inorganic multi-layers by a lift-off process (reverse etching).

* Structure
In order to pattern inorganic multi-layers without influencing a substrate, a lift-off method is used. The following diagram explains the patterning of inorganic multi-layered interference film filters.


Metal Coating
Resist Coating
Resist Pattering
Metal Etching
Resist Removal
Multi-layer Coating
Lifting-off of Metal Pattern as well as unneeded Part of Multi-layer


* Align the pattern and repeat the same process for each color: R, G, B. one after another

* Features
* Excellent in weather resistance and heat resistance
* Higher transmittance than that of organic color filters
* More expensive than organic color filters because of the complexity of its process

Coating^Etching^Bumps Making^Color Filter (Organic)^Color Filter (Inorganic)
Micro Flexible Circuit Substrate^Mask/Mirror for lasers
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