Coating&Etching/Optical Components/
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Glass, Si, Ceramics, Quartz, Sapphire, etc. are used as a substrate.

The surface of a substrate is polished.

Vacuum-vapor deposition and sputtering methods are used to make thin film.

Photo-resist is a material of photosensitive resin. Liquid type is common. There are two kinds: positive photo-resist in which the sections exposed are developed and negative photo-resist in which the sections not exposed are developed.
These are coated by spinner, roller or dip.

Prebake is a baking which removes the solvent in resist.
Each photo-resist requires precise control of temperature and time.

A technique that transfers fine pattern onto a substrate by light.
A substrate with a fine pattern drawn on it is used as a mask. The mask is placed onto a substrate on which photo-resist has been coated, to expose part of the substrate with ultraviolet rays through the mask. The wave length is unique to each resist.
The photomask pattern is usually drawn by CAD. There are film-type, emulsion-type, hard-type and transparence-type.

A technique that removes part of photo-resist not needed using an appropriate developer for each resist. Dip method or spray method is used according to the type of resist.

Postbake is a baking which removes solvent in resist and then dries up in order to strengthen the stickiness between a substrate and resist. Each resist requires proper temperature and time, which vary according to the method of resist removal resist after etching.

Many kinds of etchant (etching solution) have been developed for matching the materials of a thin-film. Different etchant is used for metal plate and vapor deposition of thin film, even if the same metal is used for both. There are dry-etching processed in a gas phase, wet-etching processed in a liquid phase and electro-etching processed in a liquid phase applying an electric current.

Appropriate exfoliation solution for each resist is used.
The solution is usually solvent or alkalization, which does not disturb the substrate and thin-film condition.

A test of appearance, size and defection of the pattern. For a more precise test, a microscope, a projector and an electric tester are used.

Product is delivered in a vacuum sealed package in order to avoid humidity.

Coating^Etching^Bumps Making^Color Filter (Inorganic)
Micro Flexible Circuit Substrate^Mask/Mirror for lasers